Innovative EUV lithography and its advantages presented by OIST's Prof. Tsumoru Shintake
Left is the industry standard model currently in use. Right is the OIST model. The innovation has significantly better stability and maintainability due to its simplified design with just two mirrors, requiring a light source of only 20W which reduces the total power consumption of the system to less than 100kW, a tenth compared to conventional technologies that often require upwards of 1mW to run. The new system retains a very high contrast while also reducing mask 3D effects, achieving the nanometer precision required to accurately transfer the logic patterns from photomask to silicon wafer. Credit: Tsumoru Shintake, 2024
Copyright OIST (Okinawa Institute of Science and Technology Graduate University, 沖縄科学技術大学院大学). Creative Commons Attribution 4.0 International License (CC BY 4.0).
