Equipment

The electron beam lithography (EBL) system is a nanofabrication tool used to write patterns onto a substrate coated with a sensitive resist with a focused electron beam. EBL systems offer high resolution, precise control over feature sizes, and flexibility in pattern design, making them essential to produce advanced electronic devices, photonic components, and nanostructures for various applications in science and technology.

Two-photon polymerization 3D printing, maskless lithography, MEMS components and microfluidic device fabrication in fused silica, as well as metamaterials and photonic crystals

The mask aligner MA6 uses UV light to transfer patterns from a mask to a substrate coated with photoresist. It enables precise alignment and exposure, crucial for creating intricate patterns in microelectronics with high throughput and repeatability.

The maskless lithography uses a laser beam to precisely expose a resist-coated substrate thought a mirror array, creating intricate patterns at the micrometer scale.

Two-photon polymerization 3D printing, maskless lithography, MEMS components and device fabrication, as well as metamaterials and photonic crystals