Electron Beam Lithography

Basically, EBL generates and focuses electron onto the surface of a pre-coated substrate with an electro-sensitive resist. The control of the deflection, combined with the ability to blank the beam, allows the system to precisely pattern the substrate accordingly to the desired design. It has a conversion capability for previously generated CAD files. The Laser interferometer stage and 18-bit DAC beam positioning system provide excellent stitching and writing capabilities. The ELS-7500EX has a Zr/W thermal field emission electron gun source which offers a minimum beam diameter of 2nm at 50Kev accelerating voltage. It can produce ultra fine features down to a 10nm linewidth. The various stage options allow for patterning of substrate sizes ranging from small pieces (5x5mm) up to wafers that are 4" in diameter.