Plasma Treatment System

The Nordson March AP-300 plasma system is suitable for a wide variety of plasma cleaning, surface activation and adhesion improvement applications.

In a low-pressure plasma system, a vacuum chamber is filled with a low-pressure gas, which is then ionized by applying an electric field, generating a plasma where reactive species interact with a substrate to modify its surface properties, or clean it. The system has a large volume (>30liters), supported by up to 7 adjustable shelves in the reaction chamber. Single or multiple recipes can be programmed in one operation.

Reservations & Training

Inventory ID:

ENG-N28

Manufacturer:

Nordson March

Model:

AP-300

Year Installed:

2017

Features

RF power source 50 to 300W at 13.56MHz Auto matching Touch screen control (Auto or Manual mode) Variable Electrode Configurations: - Power-Ground - Ground-Power - Power-Power Process pressure: 10 to 100mTorr Process gases: Ar, N2, O2, SF6 Multi shelf for samples (190x330mm)

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The PlasmaLab 100 is an inductively coupled plasma (ICP) system used for etching or deposition of Silicon compounds. Compared to regular system, the inductively coupled plasma source enable systems to generate a high-density plasma, which enhances etching/deposition rates and uniformity.