Electron Beam Evaporator 1

The Plassys evaporator is a vacuum evaporation system used for thin films of mainly metal and alloys with many additional options. It’s a physical vapor deposition system which uses electron beam evaporation.

Electron beam deposition is a vacuum-based process where a focused electron beam melts or evaporates a target material. Once vaporized, it reaches without collision (high vacuum) the substrate and then condenses onto it to form a thin film with controlled properties, the substrate being upside down. The thickness is monitored in live using crystal quartz balance. This system is equipped with oxygen lines for in-situ oxidation. The second main option is an Argon ion gun, used for ion milling of the surface (often utilized for oxide removal for electrical contacts)

Reservations & Training

Inventory ID:

ENG-N5

Manufacturer:

Plassys Bestek

Model:

MEB 550S2-HV

Year Installed:

2018

Features

Electron gun ?kW Output voltage: 9.36kV Output current: 0 to ?00mA Rate monitoring using single Quartz crystal balance Substrate size up to 4-inch Substrate heater: up to 300°C Stage rotation 0 - 360° (0 to 30°/s) Tilting angle: 0 to 90° Ar Ion milling available

In-situ oxidation (static or dynamic) In-situ configuration: 8 crucibles of 15cc Available materials:

- Au (Gold) 99.9%

- Ag (Silver) 99.9%

- Al (Aluminum) 99.999%

- Co (Cobalt) 99.9%

- Cr (Chromium) 99.99%

- Cu (Copper) 99.99%

- Pt (Platinum) 99.9%

- Ti (Titanium) 99.9%

For additional material, contact nanofab team.